Equipment Name:

Batch-type Alkaline Polishing Equipment

Equipment Model:

SC-CSZJ9600E-15F

Equipment Application:

This equipment is used for polishing, etching and cleaning treatment of diffused wafers and also compatible for texturing and cleaning treatment of bifacial solar cells.

Process Flow:

Pre-cleaning→Polishing→Post-cleaning/ O3 cleaning→Acid cleaning→Hot water drying→Drying (for reference only)

Features:

1. Throughput: 400pcs/batch,9600pcs/h(210 wafer),480pcs/batch,12000pcs/h(182 wafer).

2. Compatible with rear side etch polishing and mono-crystalline rear side texturing process.

3. Suitable for various additives.

4. Wafer thickness handling capability up to 120μm.

5. With dry clean area and self-cleaning system.

6. Quick inline bath change.

7. Suitable with MES, RFID system, inline weight testing optional.

Parameters: