Equipment Name:

Horizontal PEALD (A&P)

Equipment Model:

PD-520L/PD-520MAX

Equipment Application:

AlO+SiN Thin-film Deposition.

Features:

1、Atomic layer deposition process, with better film uniformity.

2、Multi-layer thin film deposited in the same process equipment or same furnace tube, reducing process steps and wafer breakage rate, improving yield effectively.

3、Independent R&D of liquid source precursor vapor delivery and precursor rapid switching technology.

4、Suitable for deposition of passivation layer for different precursors and materials, with a large space for process expansion.

Parameters: