Equipment Name:

HJT Inline PECVD

Equipment Model:

PD-1022/UD

Equipment Application:

Intrinsic film deposition & a-si film doping.

Processes:

Ionized precursor gases deposit thin films on a substrate.

Features:

1、Quick RF ignition with least reflect power for uniform and stable film deposition.

2、Matured and stable multi-feed in RF technology compatible for even large process chamber.

3、Continuous adjustable gas between diffuser and substrate providing flexible process possibilities.

4、High throughput with relative low cost, with capability of customized product design.

5、Modularized design for easy installation and maintenance, together with highest safety protocol from design to fabrication.

Parameters: