Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD
Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD
Equipment Name:
Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD
Equipment Model:
PAR5500A
Equipment Application:
In-line physical coating equipment for Transparent Conductive Oxide (TCO) coating on wafer,glass plate or flexible substrate.
Coating Principle:
1、Magnetron Sputter (PVD).
2、Reactive Plasma Deposition (RPD).
Features:
1、Multiple cathode operation for seed layer and multiple refractive index tandem TCO.
2、No bombardment on the substrate while keeping high mobility.
Parameters:
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